Pulsed Laser Deposition (PLD)
PLD technique is one of the physical vapour deposition techniques where a high-power pulsed laser beam is focused inside a vacuum chamber to strike a target of the material that is to be deposited. The plume (Ejected from the target by laser) contains many energetic species, including atoms, molecules, electrons, ions, clusters, particulates, and molten globules, before depositing on the typically hot substrate. Some factors that influence the deposition rate such as target material, pulse energy of the laser, repetition rate of the laser, temperature of the substrate, distance from target to substrate, type of gas and pressure in the chamber (oxygen, Ar).
MAKE : Quanta System, Italy
MODEL NUMBER : GIANT 790-10
Technical Specifications:
| Laser source | : | Nd:YAG |
| Laser energy | : | 1.7 J @1064 nm, 0.7 J @532 nm, and 0.48 J @355 nm |
| Operating wavelength (nm) | : | 355, 532, 1064 |
| Substrate Temperature | : | RT - 700°C |
| Base vacuum | : | ~10-7 mbar |
| Gas Provision | : | Variable (Ar, O2) |
| Target to substrate distance | : | Variable (3.5 to 7 cm) |
| Target size | : | 25 mm diameter as sintered pellet (Max. 6 nos) |
| Vacuum pumps | : | Rotary pump and Turbomolecular pump |
| Possible coating area | : | 3 cm in diameter |
| Possible coating | : | Ceramics, oxides, complicated compounds, alloys, metals, etc. |
Consultancy Charge Details:
| Type | Internal(Student & Staff) (Rs.) | External Educational Institution / R&D) (Rs.) | Industry(Rs.) |
| Charges per deposition/coating | 3450 | 3450 | 3450 |
| Deposition at High Temperature | 3450 | 3450 | 3450 |
Staff-Incharge:
Dr. B. Vigneshwaran, Assistant Professor (Research)
Contact Details:
| Email ID | : | vigneshwaranb92@gmail.com |
| Phone No. | : | +91- 9789446048 / 9941655429 |