DC Magnetron Sputtering

DC (Direct Current) Sputtering is a thin film coating technique where a target material to be used as the coating is bombarded with ionized gas molecules, causing atoms to be sputtered off into the plasma. These vaporized atoms are then deposited and condense as a thin film on the substrate to be coated. DC Sputtering is the most basic and inexpensive type of sputtering system for PVD-based metal deposition and electrically conductive target coating materials. Two major advantages of DC as a power source for this process are that it is easy to control and is a low-cost option if you are doing metal deposition for coating.

MAKE : Hind High Vacuum (HHV) Instruments, Bangalore
MODEL NUMBER : 12" MSPT

Technical Specifications:

Source	:	One Gun
Electrical Power	:	DC (2 KW)
Target	:	2-inch diameter
Operating Pressure	:	0.5 - 50 mTorr
Substrate Temperature	:	RT - 500°C
Vacuum Pumps	:	Rotary and Diffusion Pumps
Coating Materials	:	Conductors and Semiconductors
Coating Area (Max)	:	8x8 cm

Consultancy Charge Details:

Type	Internal(Student & Staff) (Rs.)	External Educational Institution / R&D) (Rs.)	Industry(Rs.)
Charges per deposition/coating	1500	2000	3000
Deposition at High Temperature	2000	3000	5000

Staff-Incharge:

Dr. P. Vengatesh, Assistant Professor (Research)

Contact Details:

Email ID	:	vengatesh.irc@sathyabama.ac.in
Phone No.	:	Dr. P. Vengatesh (+91-9965624377/+91-9443109774)