Electron Beam Evaporation (EBPVD)
The Electron Beam Physical Vapor Deposition (EBPVD) unit is a high-vacuum coating system that uses a focused electron beam to evaporate target materials, allowing the deposition of high-purity, well-adhered coatings with controlled microstructures. Operating at high substrate temperatures and under vacuum, it enables high deposition rates and precise control over coating properties, making it suitable for a wide range of applications.
MAKE : PLASSYS, FRANCE
MODEL NUMBER : MEB 600
Technical Specifications:
| Power | : | 13 KW |
| Acceleration Voltage | : | 8 Kv |
| Filament Current | : | 1 - 150 mA |
| Operating Pressure | : | Below 8 x 10-5 mbar |
| Substrate Temperature | : | RT - 700°C |
| Substrate Rotation | : | 3.5 RPM |
| Coating Area | : | 10 cm diameter |
| Vacuum Pumps | : | Rotary Pump and Turbomolecular Pump |
| Possible Materials | : | Metals, Semiconductors, and Ceramics |
Consultancy Charge Details:
| Type | Internal(Student & Staff) (Rs.) | External Educational Institution / R&D) (Rs.) | Industry(Rs.) |
| Charges per deposition/coating (Providing source material) | 1500 | 3000 | 4000 |
| Charges per deposition/coating (Without providing source material) | 2500 | 4000 | 6000 |
Staff-Incharge:
Dr. S. Anandh Jesuraj
Dr. Shyju T S, Associate Professor (Research)
Contact Details:
| Email ID | : | sjanandh@gmail.com / shyju@sathyabama.ac.in |
| Phone No. | : | Dr. S. Anandh Jesuraj (+91- 8973533003) Dr. Shyju T S (+91- 9941655429) |